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公开(公告)号：US20170160451A1
公开(公告)日：2017-06-08
申请号：US15327089
申请日：2015-07-10
Applicant: HAMAMATSU PHOTONICS K.K.
Inventor： Takafumi SEKO , Masaomi TAKASAKA , Hiroshi OKAMOTO
CPC classification number: G02B5/28 , G02B1/11 , G02B1/115 , G02B5/04 , G02B5/045 , G02B5/285 , G02B26/007 , G02B26/02
Abstract: An optical element includes an optical block through which object light is transmitted along a light transmission axis direction, a first wavelength selection filter provided on a first filter surface set such that a normal line forms an angle α with the light transmission axis, and a second wavelength selection filter located on a rear side with respect to the first wavelength selection filter, and provided on a second filter surface set such that a normal line forms an angle α with the light transmission axis, the second filter surface being in non-parallel, having an opposite inclination direction, and forming an angle 2α with the first filter surface. The optical block is constituted by combining an incidence-side block, a first filter block, a second filter block, and an emission-side block, formed of the same material and in the same shape.
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公开(公告)号：US20250007139A1
公开(公告)日：2025-01-02
申请号：US18711929
申请日：2022-11-01
Applicant: HAMAMATSU PHOTONICS K.K.
Inventor： Takafumi SEKO , Masaomi TAKASAKA , Hiroshi OKAMOTO
Abstract: This method for producing a bandpass filter is a method for producing a bandpass filter made of a dielectric multilayer film including: a cavity layer made of TiO2; and laminated portions arranged to sandwich the cavity layer, the laminated portion being formed by alternately laminating a first dielectric layer made of a high refractive index material and a second dielectric layer made of a low refractive index material, in which in a film formation step of the dielectric multilayer film, a film formation stop period to lower a temperature of a film formation substrate by temporarily stopping film formation during the film formation step is set.
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