公开(公告)号：US20200068695A1

公开(公告)日：2020-02-27

申请号：US16665335

申请日：2019-10-28

Applicant: Gigaphoton Inc.

Inventor： Hitoshi NAGANO ,  Yasunori WADA ,  Tatsuya YANAGIDA ,  Osamu WAKABAYASHI

IPC: H05G2/00 ,  H01S3/16 ,  H01S3/13 ,  H01L21/027 ,  G21K1/06 ,  H01S3/00 ,  H01S3/23 ,  H01S3/107 ,  H01S3/10 ,  G03F7/20

Abstract: A system for generating extreme ultraviolet light, in which a target material inside a chamber is irradiated with a laser beam to be turned into plasma, includes a first laser apparatus configured to output a first laser beam, a second laser apparatus configured to output a pedestal and a second laser beam, and a controller connected to the first and second laser apparatuses and configured to cause the first laser beam to be outputted first, the pedestal to be outputted after the first laser beam, and the second laser beam having higher energy than the pedestal to be outputted after the pedestal.

公开(公告)号：US20170196072A1

公开(公告)日：2017-07-06

申请号：US15447013

申请日：2017-03-01

Applicant: GIGAPHOTON INC.

Inventor： Hitoshi NAGANO ,  Yasunori WADA ,  Tatsuya YANAGIDA ,  Osamu WAKABAYASHI

IPC: H05G2/00 ,  H01S3/00 ,  H01L21/027 ,  H01S3/23 ,  H01S3/16 ,  G21K1/06 ,  H01S3/13 ,  H01S3/107

Abstract: A system for generating extreme ultraviolet light, in which a target material inside a chamber is irradiated with a laser beam to be turned into plasma, includes a first laser apparatus configured to output a first laser beam, a second laser apparatus configured to output a pedestal and a second laser beam, and a controller connected to the first and second laser apparatuses and configured to cause the first laser beam to be outputted first, the pedestal to be outputted after the first laser beam, and the second laser beam having higher energy than the pedestal to be outputted after the pedestal.