公开(公告)号：US12115744B2

公开(公告)日：2024-10-15

申请号：US17416899

申请日：2019-12-09

Applicant: ESSILOR INTERNATIONAL

Inventor： Zbigniew Tokarski ,  Eric Begg ,  Srinivasan Balasubramanian ,  Hao-Wen Chiu

IPC: B29D11/00 ,  G02C7/12

CPC classification number: B29D11/00644 ,  G02C7/12 ,  B29K2995/0034

Abstract: A system and method for manufacturing an ophthalmic lens is provided. The method involves preparing a cross-polarization cancelling optical film for an optical article comprising providing a film having at least a first section comprising a first edge, a second section comprising a second edge, and a predetermined color intensity; providing an apparatus, wherein the apparatus comprises at least a first roller and a second roller, wherein the first roller and the second roller are configured to stretch at least a portion of the film; and continuously and asymmetrically stretching at least a portion of the film using the apparatus, while substantially maintaining the color intensity of the film.

公开(公告)号：US12138875B2

公开(公告)日：2024-11-12

申请号：US18124958

申请日：2023-03-22

Applicant: Essilor International

Inventor： Zbigniew Tokarski

IPC: B29D11/00 ,  B32B37/12 ,  B32B38/14 ,  B32B38/16 ,  C08J7/04 ,  C08J7/043 ,  G02B1/10

Abstract: The disclosure provides post-production methods for functionalization of optical quality films produced by top tier manufactures. The methods disclosed herein allow for the incorporation of different additives into existing films.

公开(公告)号：US11878480B2

公开(公告)日：2024-01-23

申请号：US17120763

申请日：2020-12-14

Applicant: Essilor International

Inventor： Peiqi Jiang ,  Arnaud Glacet ,  Zbigniew Tokarski

IPC: B29D11/00

CPC classification number: B29D11/0048

Abstract: The present disclosure includes systems, devices, and methods for preventing contamination during formation of an optical article. In some implementations, a device for preventing contamination of a mold cavity during injection molding of a function wafer includes a containment band having an annular base that defines a first opening configured to receive a functional wafer. The device also includes one or more sidewalls that project a first direction from and surround at least a portion of the first opening. The one or more sidewalls may be configured such that, during formation of an optical article, a first portion of the functional wafer is in contact with the one or more sidewalls.

公开(公告)号：US12251897B2

公开(公告)日：2025-03-18

申请号：US17801548

申请日：2021-02-25

Applicant: Essilor International

Inventor： Ahmed Drammeh ,  Eric Begg ,  Zbigniew Tokarski ,  Peiqi Jiang

IPC: B32B25/08 ,  B29D11/00 ,  G02B1/04 ,  B29K69/00 ,  B29K75/00

Abstract: A method of forming an ophthalmic laminate lens, includes: forming a planar laminate by adhering a first polycarbonate layer to a first side of a thermoplastic elastomer layer, and adhering a second polycarbonate layer to a second side of the thermoplastic elastomer layer, the first polycarbonate layer having a thickness greater than 250 μm, the second polycarbonate layer having a thickness greater than 250 μm, and the thermoplastic elastomer layer having a thickness in a range of 15 μm to 150 μm; thermoforming the planar laminate into a curved laminate, the curve laminate having a pre-molding curvature; arranging the curved laminate in a mold; and molding, via the mold set at a predetermined temperature and a predetermined pressure, the curved laminate with a polymer melt into a curved lens.

公开(公告)号：US11648742B2

公开(公告)日：2023-05-16

申请号：US16624516

申请日：2018-06-25

Applicant: Essilor International

Inventor： Zbigniew Tokarski

IPC: B29D11/00 ,  G02B1/10 ,  C08J7/043 ,  B32B37/12 ,  B32B38/14 ,  B32B38/16

CPC classification number: B29D11/0073 ,  B29D11/00788 ,  B32B37/12 ,  B32B38/14 ,  C08J7/043 ,  G02B1/10 ,  B32B2038/168 ,  B32B2310/0418

Abstract: The disclosure provides post-production methods for functionalization of optical quality films produced by top tier manufactures. The methods disclosed herein allow for the incorporation of different additives into existing films.

公开(公告)号：US11833772B2

公开(公告)日：2023-12-05

申请号：US17120638

申请日：2020-12-14

Applicant: Essilor International

Inventor： Zbigniew Tokarski ,  Eric Begg ,  Ahmed Drammeh ,  Hao-Wen Chiu

IPC: B29D11/00 ,  B29B11/02 ,  B29K101/12 ,  G02C7/02

CPC classification number: B29D11/0048 ,  B29B11/02 ,  B29K2101/12 ,  G02C7/02 ,  G02C2202/16

Abstract: The present disclosure includes systems, apparatuses, and methods for an optical system. In some aspects, the systems and devices may produce a wafer for use in the manufacture of an optical article. The wafer includes a laminate having a first layer that includes a first matrix material having a lower surface and an upper surface opposite the lower surface and a second layer that includes a second matrix material, the second layer is coupled to the first layer and covers at least a portion of the lower surface or the upper surface. The first layer includes a first thickness at a central portion that is greater than a second thickness at an edge portion.