公开(公告)号：US20210189550A1

公开(公告)日：2021-06-24

申请号：US17055885

申请日：2019-03-15

申请人： ENTEGRIS, INC.

发明人： Oleg BYL ,  Ying TANG ,  Joseph R. DESPRES ,  Joseph SWEENEY ,  Sharad N. YEDAVE

IPC分类号： C23C14/48 ,  H01J37/317 ,  C23C14/56 ,  H01J37/08

摘要： The current disclosure is directed to methods and assemblies configured to deliver a mixture of germanium tetrafluoride (GeF4) and hydrogen (H2) gases to an ion implantation apparatus, so H2 is present in an amount in the range of 25%-67% (volume) N of the gas mixture, or the GeF4 and H2 are present in a volume ratio (GeF4:H2) in the range of 3:1 to 33:67. The use of the H2 gas in an amount in mixture or relative to the GeF4 gas prevents the volatilization of cathode material, thereby improving performance and lifetime of the ion implantation apparatus. Gas mixtures according to the disclosure also result in a significant Ge+ current gain and W+ peak reduction during an ion implantation procedure.

公开(公告)号：US20200248873A1

公开(公告)日：2020-08-06

申请号：US16855684

申请日：2020-04-22

申请人： ENTEGRIS, INC.

发明人： Daniel ELZER ,  Ying TANG ,  Barry L. CHAMBERS ,  Joseph D. SWEENEY ,  Shaun M. WILSON ,  Steven E. BISHOP ,  Steven ULANECKI ,  James V. MCMANUS ,  Oleg BYL ,  Christopher SCANNELL ,  Edward E. JONES ,  Joseph R. DESPRES

IPC分类号： F17C13/04 ,  F17C11/00

摘要： Fluid dispensing assemblies are disclosed, for use in fluid supply packages in which such fluid dispensing assemblies as coupled to fluid supply vessels, for dispensing of fluids such as semiconductor manufacturing fluids. The fluid dispensing assemblies in specific implementations are configured to prevent application of excessive force to valve elements in the fluid dispensing assemblies, and/or for avoiding inadvertent or accidental open conditions of vessels that may result in leakage of toxic or otherwise hazardous or valuable gas. Also described are alignment devices for assisting coupling of coupling elements, e.g., coupling elements of fluid supply packages of the foregoing type, so that damage to such couplings as a result of misalignment is avoided.

公开(公告)号：US20200083015A1

公开(公告)日：2020-03-12

申请号：US16564965

申请日：2019-09-09

申请人： ENTEGRIS, INC.

发明人： Joseph D. SWEENEY ,  Joseph R. DESPRES ,  Ying TANG ,  Sharad N. YEDAVE ,  Edward E. JONES ,  Oleg BYL

IPC分类号： H01J37/08 ,  H01J37/317

摘要： An ion source apparatus for ion implantation is described, including an ion source chamber, and a consumable structure in or associated with the ion source chamber, in which the consumable structure includes a solid dopant source material susceptible to reaction with a reactive gas for release of dopant in gaseous form to the ion source chamber, wherein the solid dopant source material comprises gallium nitride, gallium oxide, either of which may be isotopically enriched with respect to a gallium isotope, or combinations thereof.

公开(公告)号：US20210398773A1

公开(公告)日：2021-12-23

申请号：US17466362

申请日：2021-09-03

申请人： Entegris, Inc.

发明人： Ying TANG ,  Sharad N. YEDAVE ,  Joseph R. DESPRES ,  Joseph D. SWEENEY ,  Oleg BYL

IPC分类号： H01J37/317 ,  H01J37/08

摘要： A system and method for ion implantation is described, which includes a gas or gas mixture including at least one ionizable gas used to generate ionic species and an arc chamber that includes two or more different arc chamber materials. Using the system ionic species are generated in the arc chamber with liner combination, and one or more desired ionic species display a higher beam current among the ionic species generated, which is facilitated by use of the different materials. In turn improved implantation of the desired ionic species into a substrate can be achieved. Further, the system can minimize formation of metal deposits during system operation, thereby extending source life and promoting improved system performance.

公开(公告)号：US20210341106A1

公开(公告)日：2021-11-04

申请号：US17244650

申请日：2021-04-29

申请人： ENTEGRIS, INC.

发明人： Edward E. JONES ,  Sarah A. UTZ ,  Joseph R. DESPRES

IPC分类号： F17C13/00 ,  G01M13/003

摘要： Regulator assemblies can be tested using test fluids selected to have a molecular weight about that of a selected fluid to be dispensed from a fluid storage and delivery vessel including the regulator assembly. The test fluid can be a single gas or a mixture. The test fluid can have a molecular weight of between 80% and 110% of the molecular weight of the selected fluid dispensed from the fluid storage and delivery vessel. Regulator assemblies tested in this manner can pass evaluation when they show fewer than two spikes on the initiation of flow of the test gas. These regulator assemblies can be installed into fluid storage and delivery vessels, particularly for storage and delivery of pressurized fluids.

公开(公告)号：US20220128196A1

公开(公告)日：2022-04-28

申请号：US17505735

申请日：2021-10-20

申请人： ENTEGRIS, INC.

发明人： Joseph R. DESPRES ,  Joseph SWEENEY ,  Edward A. STURM

IPC分类号： F17C11/00 ,  B01D53/02 ,  B01J20/30 ,  B01J20/20

摘要： Described are storage and dispensing systems and related methods, for the storage and selective dispensing germane a reagent gas from a vessel in which the reagent gas is held in sorptive relationship to a solid adsorbent medium at an interior of a storage vessel and wherein the methods and dispensing systems provide dispensing of the reagent gas from the storage vessel with a reduced level of atmospheric impurities contained in the dispensed reagent gas.

公开(公告)号：US20200088318A1

公开(公告)日：2020-03-19

申请号：US16564496

申请日：2019-09-09

申请人： ENTEGRIS, INC. ,  LUXEMBOUG PATENT COMPANY SA

发明人： Christopher SCANNELL ,  Joseph R. DESPRES ,  Pascal CHIR ,  Paul MUZZO

IPC分类号： F16K37/00 ,  F17C13/04

摘要： A valve system having a valve position indicator is disclosed. The valve position indicator allows for viewing of the valve position from one or more viewing locations. In one example, the valve position indicator includes a side valve open/close indicator and a top valve open/close indicator on a valve assembly. An indicator locking mechanism securely locks the valve position indicator in alignment with a position of a control valve.

公开(公告)号：US20180119888A1

公开(公告)日：2018-05-03

申请号：US15573020

申请日：2016-05-11

申请人： ENTEGRIS, INC.

发明人： Daneil ELZER ,  Ying TANG ,  Barry Lewis CHAMBERS ,  Joseph D. SWEENEY ,  Shaun M. WILSON ,  Steven ULANECKI ,  Steven E. BISHOP ,  James V. MCMANUS ,  Karl W. OLANDER ,  Edward E. JONES ,  Oleg BYL ,  Joseph R. DESPRES ,  Christopher SCANNELL

IPC分类号： F17C13/04

CPC分类号： F17C13/04 ,  F17C11/00 ,  F17C2201/0114 ,  F17C2201/0119 ,  F17C2201/058 ,  F17C2203/0617 ,  F17C2205/0308 ,  F17C2205/0329 ,  F17C2205/0335 ,  F17C2205/0338 ,  F17C2205/0385 ,  F17C2205/0391

摘要： Fluid dispensing assemblies are disclosed, for use in fluid supply packages in which such fluid dispensing assemblies as coupled to fluid supply vessels, for dispensing of fluids such as semiconductor manufacturing fluids. The fluid dispensing assemblies in specific implementations are configured to prevent application of excessive force to valve elements in the fluid dispensing assemblies, and/or for avoiding inadvertent or accidental open conditions of vessels that may result in leakage of toxic or otherwise hazardous or valuable gas. Also described are alignment devices for assisting coupling of coupling elements, e.g., coupling elements of fluid supply packages of the foregoing type, so that damage to such couplings as a result of misalignment is avoided.

公开(公告)号：US20210020402A1

公开(公告)日：2021-01-21

申请号：US16904286

申请日：2020-06-17

申请人： ENTEGRIS, INC.

发明人： Ying TANG ,  Sharad N. YEDAVE ,  Joseph R. DESPRES ,  Joseph D. SWEENEY ,  Oleg BYL

IPC分类号： H01J37/317 ,  H01J37/08

摘要： A system and method for ion implantation is described, which includes a gas or gas mixture including at least one ionizable gas used to generate ionic species and an arc chamber that includes two or more different arc chamber materials. Using the system ionic species are generated in the arc chamber with liner combination, and one or more desired ionic species display a higher beam current among the ionic species generated, which is facilitated by use of the different materials. In turn improved implantation of the desired ionic species into a substrate can be achieved. Further, the system can minimize formation of metal deposits during system operation, thereby extending source life and promoting improved system performance.

公开(公告)号：US20190189402A1

公开(公告)日：2019-06-20

申请号：US16192416

申请日：2018-11-15

申请人： ENTEGRIS, INC.

发明人： Sharad N. YEDAVE ,  Ying TANG ,  Joseph R. DESPRES ,  Joseph D. SWEENEY

IPC分类号： H01J37/32 ,  H01J37/317 ,  H01J37/08

CPC分类号： H01J37/32449 ,  H01J37/08 ,  H01J37/3171 ,  H01J2237/004 ,  H01J2237/31701

摘要： A gas supply assembly is described for delivery of gas to a plasma flood gun which includes an inert gas and a fluorine-containing gas, wherein the assembly is configured to deliver a volume of the fluorine-containing gas to the flood gun that is not greater than 10% of a total volume of the fluorine-containing and inert gasses. The fluorine-containing gas can generate volatile reaction product gases from material deposits in the plasma flood gun, and to effect re-metallization of a plasma generation filament in the plasma flood gun. In combination with the gas amounts, the assembly and methods can use gas flow rates to optimize the cleaning effect and reduce filament material loss from the plasma flood gun during use.