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公开(公告)号：US20190051768A1
公开(公告)日：2019-02-14
申请号：US16154330
申请日：2018-10-08
Applicant: Applied Materials, Inc.
Inventor： Yong CAO , Daniel Lee DIEHL , Rongjun WANG , Xianmin TANG , Tai-chou Papo CHEN , Tingjun XU
Abstract: A method for forming an anti-reflective coating (ARC) includes positioning a substrate below a target and flowing a first gas to deposit a first portion of the graded ARC onto the substrate. The method includes gradually flowing a second gas to deposit a second portion of the graded ARC, and gradually flowing a third gas while simultaneously gradually decreasing the flow of the second gas to deposit a third portion of the graded ARC. The method also includes flowing the third gas after stopping the flow of the second gas to form a fourth portion of the graded ARC. In another embodiment a film stack having a substrate having a graded ARC disposed thereon is provided. The graded ARC includes a first portion, a second portion disposed on the first portion, a third portion disposed on the second portion, and a fourth portion disposed on the third portion.
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