公开(公告)号：US10347475B2

公开(公告)日：2019-07-09

申请号：US14846951

申请日：2015-09-07

Applicant: Applied Materials, Inc.

Inventor： Kathleen Scheible ,  Michael Allen Flanigan ,  Goichi Yoshidome ,  Adolph Miller Allen ,  Christopher Pavloff

IPC: H01J37/34 ,  H01L21/687 ,  C23C14/34 ,  C23C14/50

Abstract: A holding assembly for retaining a deposition ring about a periphery of a substrate support in a substrate processing chamber, the deposition ring comprising a peripheral recessed pocket with a holding post. The holding assembly comprises a restraint beam capable of being attached to the substrate support, the restraint beam comprising two ends, and an anti-lift bracket. The anti-lift bracket comprises a block comprising a through-channel to receive an end of a restraint beam, and a retaining hoop attached to the block, the retaining hoop sized to slide over and encircle the holding post in the peripheral recessed pocket of the deposition ring.

公开(公告)号：US20150380223A1

公开(公告)日：2015-12-31

申请号：US14846951

申请日：2015-09-07

Applicant: Applied Materials, Inc.

Inventor： Kathleen Scheible ,  Michael Allen Flanigan ,  Goichi Yoshidome ,  Adolph Miller Allen ,  Christopher Pavloff

IPC: H01J37/34

CPC classification number: H01J37/3488 ,  C23C14/3407 ,  C23C14/50 ,  H01J37/34 ,  H01J37/3441 ,  H01J37/3447 ,  H01L21/68735

Abstract: A holding assembly for retaining a deposition ring about a periphery of a substrate support in a substrate processing chamber, the deposition ring comprising a peripheral recessed pocket with a holding post. The holding assembly comprises a restraint beam capable of being attached to the substrate support, the restraint beam comprising two ends, and an anti-lift bracket. The anti-lift bracket comprises a block comprising a through-channel to receive an end of a restraint beam, and a retaining hoop attached to the block, the retaining hoop sized to slide over and encircle the holding post in the peripheral recessed pocket of the deposition ring.

Abstract translation: 一种保持组件，用于在衬底处理室中保持沉积环周围的衬底支撑件的周边，所述沉积环包括具有保持柱的外围凹槽。 保持组件包括能够附接到基板支撑件的约束梁，包括两个端部的约束梁和防起重托架。 防起重托架包括一个块体，该块体包括用于接纳约束梁的一端的通道，以及附着在该块上的保持环箍，该保持箍的尺寸适于在保持杆的外周凹槽中滑动并围绕 沉积环。

公开(公告)号：US11658016B2

公开(公告)日：2023-05-23

申请号：US16409757

申请日：2019-05-10

Applicant: Applied Materials, Inc.

Inventor： Kathleen Scheible ,  Michael Allen Flanigan ,  Goichi Yoshidome ,  Adolph Miller Allen ,  Cristopher Pavloff

IPC: H01J37/34 ,  C23C14/34 ,  C23C14/50 ,  H01L21/687

CPC classification number: H01J37/3488 ,  C23C14/3407 ,  C23C14/50 ,  H01J37/34 ,  H01J37/3441 ,  H01J37/3447 ,  H01L21/68735

Abstract: A shield encircles a sputtering target that faces a substrate support in a substrate processing chamber. The shield comprises an outer band having a diameter sized to encircle the sputtering target, the outer band having upper and bottom ends, and the upper end having a tapered surface extending radially outwardly and adjacent to the sputtering target. A base plate extends radially inward from the bottom end of the outer band. An inner band joined to the base plate at least partially surrounds a peripheral edge of a substrate support. The shield can also have a heat exchanger comprising a conduit with an inlet and outlet to flow heat exchange fluid therethrough.

公开(公告)号：US20190267220A1

公开(公告)日：2019-08-29

申请号：US16409757

申请日：2019-05-10

Applicant: Applied Materials, Inc.

Inventor： Kathleen Scheible ,  Michael Allen Flanigan ,  Goichi Yoshidome ,  Adolph Miller Allen ,  Cristopher Pavloff

IPC: H01J37/34 ,  H01L21/687 ,  C23C14/34 ,  C23C14/50

Abstract: A shield encircles a sputtering target that faces a substrate support in a substrate processing chamber. The shield comprises an outer band having a diameter sized to encircle the sputtering target, the outer band having upper and bottom ends, and the upper end having a tapered surface extending radially outwardly and adjacent to the sputtering target. A base plate extends radially inward from the bottom end of the outer band. An inner band joined to the base plate at least partially surrounds a peripheral edge of a substrate support. The shield can also have a heat exchanger comprising a conduit with an inlet and outlet to flow heat exchange fluid therethrough.