公开(公告)号：US20250034305A1

公开(公告)日：2025-01-30

申请号：US18779695

申请日：2024-07-22

Applicant: Align Technology, Inc.

Inventor： Umesh Upendra CHOUDHARY ,  Jessica Kalay SU ,  Michael Christopher COLE ,  Jennifer Marie CHAVEZ

IPC: C08F220/12 ,  A61C7/00 ,  B33Y70/00 ,  B33Y80/00 ,  C08F2/50 ,  C08F220/30

Abstract: Provided herein are curable compositions for use in a high temperature lithography-based photopolymerization process, and telechelic block polymers and methods of using such polymers in curable compositions to produce medical devices such as orthodontic appliances comprising the polymeric compositions comprising the telechelic block polymers.

公开(公告)号：US20240376039A1

公开(公告)日：2024-11-14

申请号：US18441651

申请日：2024-02-14

Applicant: Align Technology, Inc.

Inventor： Umesh Upendra CHOUDHARY ,  Jessica Kalay SU

IPC: C07C69/86 ,  A61C7/08 ,  B33Y70/00 ,  B33Y80/00 ,  C08F2/50 ,  C08F20/18 ,  C08J5/18

Abstract: The present disclosure provides monomer compounds that can produce desirable polymeric materials and photo-curable resins. Further provided herein are methods of producing compounds, compositions, resins, devices, and polymeric materials. Also provided herein are methods of using compounds, resins, and polymeric materials for the fabrication (e.g., via 3D printing) of medical devices, such as orthodontic appliances.

公开(公告)号：US20220380502A1

公开(公告)日：2022-12-01

申请号：US17728865

申请日：2022-04-25

Applicant: Align Technology, Inc.

Inventor： Umesh Upendra CHOUDHARY ,  Jessica Kalay SU ,  Jennifer Marie CHAVEZ ,  Michael Christopher COLE ,  Raymond Bao THAI

IPC: C08F220/30 ,  C08F2/50

Abstract: The present disclosure provides photo-polymerizable monomers, photo-curable resins comprising one or more of such monomers, as well as polymeric materials formed from the photo-curable resins. Further provided herein are methods of producing the compositions and using the same for the fabrication of medical devices, such as orthodontic appliances.

公开(公告)号：US20250154305A1

公开(公告)日：2025-05-15

申请号：US19021547

申请日：2025-01-15

Applicant: Align Technology, Inc.

Inventor： Umesh Upendra CHOUDHARY ,  Jessica Kalay SU ,  Jennifer Marie CHAVEZ ,  Michael Christopher COLE ,  Raymond Bao THAI

IPC: C08F220/12 ,  A61C7/00 ,  B33Y70/00 ,  B33Y80/00 ,  C08F2/50 ,  C08F220/30

Abstract: The present disclosure provides photo-polymerizable monomers, photo-curable resins comprising one or more of such monomers, as well as polymeric materials formed from the photo-curable resins. Further provided herein are methods of producing the compositions and using the same for the fabrication of medical devices, such as orthodontic appliances.

公开(公告)号：US20240191006A1

公开(公告)日：2024-06-13

申请号：US18494569

申请日：2023-10-25

Applicant: Align Technology, Inc.

Inventor： Umesh Upendra CHOUDHARY ,  Jessica Kalay SU ,  Jennifer Marie CHAVEZ ,  Michael Christopher COLE ,  Raymond Bao THAI

IPC: C08F20/30 ,  A61C8/00 ,  B29C64/124 ,  B29K33/00 ,  B29K105/00 ,  B33Y10/00 ,  B33Y70/00 ,  B33Y80/00 ,  C08F20/18

CPC classification number: C08F20/30 ,  A61C8/0016 ,  B33Y70/00 ,  B33Y80/00 ,  C08F20/18 ,  A61C2201/00 ,  B29C64/124 ,  B29K2033/08 ,  B29K2105/0002 ,  B33Y10/00

Abstract: The present disclosure provides curable compositions comprising one or more of photo-polymerizable monomers as reactive diluents, as well as polymeric materials formed from the curable compositions. Further provided herein are methods of producing the compositions and using the same for the fabrication of medical devices, such as orthodontic appliances.

公开(公告)号：US20250011518A1

公开(公告)日：2025-01-09

申请号：US18590453

申请日：2024-02-28

Applicant: Align Technology, Inc.

Inventor： Jessica Kalay SU

IPC: C08F297/02 ,  A61C7/00 ,  A61C7/08 ,  B33Y70/00 ,  B33Y80/00 ,  C09D153/00

Abstract: The present disclosure provides micelles comprising a plurality of block co-polymers, the micelle comprising (i) a core comprising at least a portion of a poly(alkyl acrylate) block of one or more of the block co-polymers; and (ii) an outer layer comprising at least a portion of a poly(aryl acrylate) block or a poly(aryl methacrylate) block of one or more of the block co-polymers. The present disclosure also includes polymer compositions, polymer films, and devices (e.g., orthodontic equipment) including the same. Methods for making and using micelles, polymer compositions, polymer films, and devices (e.g., orthodontic equipment) are also disclosed. Further provided herein are methods of producing polymer compositions and using the same for the fabrication (e.g., via 3D printing) of medical devices, such as orthodontic appliances.

公开(公告)号：US20230212107A1

公开(公告)日：2023-07-06

申请号：US18091312

申请日：2022-12-29

Applicant: Align Technology, Inc.

Inventor： Umesh Upendra CHOUDHARY ,  Jessica Kalay SU

IPC: C07C69/54 ,  C07C67/08 ,  C08F220/68 ,  B33Y70/00

CPC classification number: C07C69/54 ,  C07C67/08 ,  C08F220/68 ,  B33Y70/00 ,  C07C2601/16 ,  A61C7/08

Abstract: The present disclosure provides polymerizable monomers which may be used as reactive diluents in additive manufacturing. The polymerizable monomers may have low vapor pressures and may be compatible with a range of low glass transition temperature oligomers.

公开(公告)号：US20230021953A1

公开(公告)日：2023-01-26

申请号：US17849529

申请日：2022-06-24

Applicant: Align Technology, Inc.

Inventor： Umesh Upendra CHOUDHARY ,  Raymond Bao THAI ,  Jessica Kalay SU

IPC: C08G18/63

Abstract: The present disclosure provides photo-polymerizable components, photo-curable resins comprising one or more of such monomers, as well as polymeric materials formed from the photo-curable resins. Further provided herein are methods of producing the compositions and using the same for the fabrication of medical devices, such as orthodontic appliances.