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公开(公告)号：US12298257B2
公开(公告)日：2025-05-13
申请号：US18012801
申请日：2021-06-09
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
Inventor： Ilse Van Weperen , Arjan Johannes Anton Beukman , Mohamed Swillam , Justin Lloyd Kreuzer , Stephen Roux
IPC: G01N21/956
Abstract: Systems, apparatuses, and methods are provided for detecting a particle on a substrate surface. An example method can include receiving, by a grating structure, coherent radiation from a radiation source. The method can further include generating, by the grating structure, a focused coherent radiation beam based on the coherent radiation. The method can further include transmitting, by the grating structure, the focused coherent radiation beam toward a region of a surface of a substrate. The method can further include receiving, by the grating structure, photons scattered from the region in response to illuminating the region with the focused coherent radiation beam. The method can further include measuring, by a photodetector, the photons received by the grating structure. The method can further include generating, by the photodetector and based on the measured photons, an electronic signal for detecting a particle located in the region of the surface of the substrate.
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公开(公告)号：US12140875B2
公开(公告)日：2024-11-12
申请号：US17910118
申请日：2021-03-03
Applicant: ASML Netherlands B.V.
Inventor： Ilse Van Weperen , Han-Kwang Nienhuys , Teis Johan Coenen
Abstract: Methods and apparatus for determining a parameter of a structure fabricated in or on a substrate and compensated for a drift error. The methods comprising: illuminating, at a plurality of times, at least part of the structure with electromagnetic radiation, the at least part of the structure being at a first orientation; sensing, at the plurality of times, a plurality of average reflectances of the at least part of the structure; and determining, based on the plurality of average reflectances, an estimation of the parameter at one or more further times.
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