公开(公告)号：US20130215408A1

公开(公告)日：2013-08-22

申请号：US13748889

申请日：2013-01-24

Applicant: ASML Netherlands B.V.

Inventor： Norbertus Josephus Martinus VAN DEN NIEUWELAAR ,  Petrus Franciscus Van Gils ,  Arthur Erland Swaving

IPC: G03F7/00

CPC classification number: G03F7/7075 ,  G03F7/00 ,  G03F7/70533 ,  G03F7/70725 ,  G03F7/70733 ,  G03F7/70991

Abstract: A substrate handler for transferring substrates to be exposed from a track to a lithographic apparatus. The substrate handler comprises a controller. The controller is configured to determine an instance for starting a transfer process of a first one of the substrates. The instance is based on a predetermined processing characteristic of the lithographic apparatus, in order to maintain a transfer period of the substrate in the substrate handler substantially constant.

Abstract translation: 用于将要从轨道暴露的衬底转移到光刻设备的衬底处理器。 基板处理器包括控制器。 控制器被配置为确定用于开始第一个基板的传送处理的实例。 该实例基于光刻设备的预定处理特性，以便保持基板处理器中的基板的转印周期基本恒定。

公开(公告)号：US09606457B2

公开(公告)日：2017-03-28

申请号：US13748889

申请日：2013-01-24

Applicant: ASML Netherlands B.V.

Inventor： Norbertus Josephus Martinus Van Den Nieuwelaar ,  Petrus Franciscus Van Gils ,  Arthur Erland Swaving

IPC: G03B27/42 ,  G03B27/58 ,  G03B27/32 ,  G03F7/20 ,  G03F7/00

CPC classification number: G03F7/7075 ,  G03F7/00 ,  G03F7/70533 ,  G03F7/70725 ,  G03F7/70733 ,  G03F7/70991

Abstract: A substrate handler for transferring substrates to be exposed from a track to a lithographic apparatus. The substrate handler comprises a controller. The controller is configured to determine an instance for starting a transfer process of a first one of the substrates. The instance is based on a predetermined processing characteristic of the lithographic apparatus, in order to maintain a transfer period of the substrate in the substrate handler substantially constant.