-
公开(公告)号:US20250029811A1
公开(公告)日:2025-01-23
申请号:US18907436
申请日:2024-10-04
Applicant: ASML Netherlands B.V.
Inventor: Arthur Eduard OVERLACK , Ronald KROON , Richard Michel VAN LEEUWEN , Andre Luis RODRIGUES MANSANO , Herre Tjerk STEENSTRA , Erwin Robert Alexander VISSER
IPC: H01J37/244 , H01J37/28
Abstract: The embodiments of the present disclosure provide a sensor substrate for a charged particle optical device and/or a charged particle assessment apparatus, the sensor substrate comprising: at least one distance sensor configured to generate a measurement signal representative of a distance between the distance sensor and a facing surface of a target; and at least one charged particle optical component.