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公开(公告)号：US10852633B2
公开(公告)日：2020-12-01
申请号：US15771634
申请日：2016-10-25
Applicant: ASML NETHERLANDS B.V.
Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method including: providing a stack including a membrane layer between a supporting substrate and an attachment substrate, wherein the supporting substrate includes an inner region and a border region; processing the stack, including selectively removing the inner region of the supporting substrate, to form a membrane assembly comprising: a membrane formed from at least the membrane layer; and a support holding the membrane, the support formed at least partially from the border region of the supporting substrate. The attachment substrate can be bonded to the rest of the stack.
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公开(公告)号：US10712656B2
公开(公告)日：2020-07-14
申请号：US15752302
申请日：2016-08-26
Applicant: ASML NETHERLANDS B.V.
Inventor： Zomer Silvester Houweling , Eric Willem Felix Casimiri , Tamara Druzhinina , Paul Janssen , Michael Alfred Josephus Kuijken , Martinus Hendrikus Antonius Leenders , Sicco Oosterhoff , Mária Péter , Willem Joan Van Der Zande , Pieter-Jan Van Zwol , Beatrijs Louise Marie-Joseph Katrien Verbrugge , Johannes Petrus Martinus Bernardus Vermeulen , David Ferdinand Vles , Willem-Pieter Voorthuijzen
Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising a planar substrate and at least one membrane layer, wherein the planar substrate comprises an inner region and a border region around the inner region; positioning the stack on a support such that the inner region of the planar substrate is exposed; and selectively removing the inner region of the planar substrate using a non-liquid etchant, such that the membrane assembly comprises: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border formed from the border region of the planar substrate.
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