公开(公告)号：US11126007B2

公开(公告)日：2021-09-21

申请号：US16913698

申请日：2020-06-26

Applicant: ASML Holding N.V.

Inventor： Douglas C. Cappelli ,  Stanislav Smirnov ,  Richard Carl Zimmerman ,  Joshua Adams ,  Alexander Kenneth Raub ,  Yevgeniy Konstantinovich Shmarev

IPC: G03F7/20 ,  G02B27/28 ,  G01N21/47 ,  G01N21/956

Abstract: According to one embodiment, a prism system is provided. The prism system includes a polarizing beam splitter (PBS) surface. The PBS surface is configured to generate first and second sub-beams having corresponding first and second polarization information from a received beam, the second polarization information being different than the first polarization information. A first optical path of the first sub-beam within the prism system has substantially same length as a second optical path of the second sub-beam within the prism system. Additionally or alternatively, the first sub-beam achieves a predetermined polarization extinction ratio.

公开(公告)号：US10809193B2

公开(公告)日：2020-10-20

申请号：US16362922

申请日：2019-03-25

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Marinus Johannes Maria Van Dam ,  Richard Carl Zimmerman

IPC: G01N21/47 ,  G03F7/20 ,  G01N21/21

Abstract: An inspection apparatus or lithographic apparatus includes an optical system and a detector. The optical system includes a non-linear prismatic optic. The optical system is configured to receive zeroth and first diffraction order beams reflected from a diffraction target and separate first and second polarizations of each diffraction order beam. The detector is configured to simultaneously detect first and second polarizations of each of the zeroth and first diffraction order beams. Based on the detected first and second polarizations of one or more diffraction orders, an operational parameter of a lithographic apparatus can be adjusted to improve accuracy or precision in the lithographic apparatus. The optical system can include a plurality of non-linear prismatic optics. For example, the optical system can include a plurality of Wollaston prisms.

公开(公告)号：US20190310190A1

公开(公告)日：2019-10-10

申请号：US16362922

申请日：2019-03-25

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Marinus Johannes Maria VAN DAM ,  Richard Carl Zimmerman

IPC: G01N21/47 ,  G01N21/21 ,  G03F7/20

Abstract: An inspection apparatus or lithographic apparatus includes an optical system and a detector. The optical system includes a non-linear prismatic optic. The optical system is configured to receive zeroth and first diffraction order beams reflected from a diffraction target and separate first and second polarizations of each diffraction order beam. The detector is configured to simultaneously detect first and second polarizations of each of the zeroth and first diffraction order beams. Based on the detected first and second polarizations of one or more diffraction orders, an operational parameter of a lithographic apparatus can be adjusted to improve accuracy or precision in the lithographic apparatus. The optical system can include a plurality of non-linear prismatic optics. For example, the optical system can include a plurality of Wollaston prisms.

公开(公告)号：US10747010B2

公开(公告)日：2020-08-18

申请号：US16217424

申请日：2018-12-12

Applicant: ASML Holding N.V.

Inventor： Douglas C. Cappelli ,  Stanislav Smirnov ,  Richard Carl Zimmerman ,  Joshua Adams ,  Alexander Kenneth Raub ,  Yevgeniy Konstantinovich Shmarev

IPC: G01N21/956 ,  G03F7/20 ,  G02B27/28 ,  G01N21/47

Abstract: According to one embodiment, a prism system is provided. The prism system includes a polarizing beam splitter (PBS) surface. The PBS surface is configured to generate first and second sub-beams having corresponding first and second polarization information from a received beam, the second polarization information being different than the first polarization information. A first optical path of the first sub-beam within the prism system has substantially same length as a second optical path of the second sub-beam within the prism system. Additionally or alternatively, the first sub-beam achieves a predetermined polarization extinction ratio.