发明授权
- 专利标题: Method for producing functional device and apparatus for producing functional device
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申请号: US14357138申请日: 2012-11-07
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公开(公告)号: US09929188B2公开(公告)日: 2018-03-27
- 发明人: Tatsuya Shimoda , Toshihiko Kaneda
- 申请人: Japan Science and Technology Agency
- 申请人地址: JP Saitama
- 专利权人: Japan Science and Technology Agency
- 当前专利权人: Japan Science and Technology Agency
- 当前专利权人地址: JP Saitama
- 代理机构: Seed IP Law Group LLP
- 优先权: JP2011-245922 20111109
- 国际申请: PCT/JP2012/078849 WO 20121107
- 国际公布: WO2013/069686 WO 20130516
- 主分类号: B44C1/22
- IPC分类号: B44C1/22 ; H01L27/12 ; H01L45/00 ; H01L41/09 ; H01L41/317 ; H01L41/332 ; H01L29/786 ; B41J2/16 ; H01L21/67 ; H01L27/108 ; H01L21/28 ; H01L29/78 ; H01L49/02
摘要:
According to the present invention, a method of producing a functional device includes the imprinting step and the functional solid material layer formation step. In the imprinting step, a functional solid material precursor layer obtained from a functional solid material precursor solution as a start material is imprinted so that a first temperature of a heat source for supplying heat to the functional solid material precursor layer is higher than a second temperature of the functional solid material precursor layer in at least part of a time period while a mold for forming an imprinted structure is pressed against the functional solid material precursor layer. In the functional solid material layer formation step, after the imprinting step, the functional solid material precursor layer is heat treated at a third temperature higher than the first temperature in an atmosphere containing oxygen to form a functional solid material layer from the functional solid material precursor layer.
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