- 专利标题: Metal-insulator-metal diodes and methods of fabrication
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申请号: US14908899申请日: 2013-07-31
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公开(公告)号: US09887271B2公开(公告)日: 2018-02-06
- 发明人: Aya Seike
- 申请人: Empire Technology Development LLC
- 申请人地址: US DE Wilmington
- 专利权人: EMPIRE TECHNOLOGY DEVELOPMENT LLC
- 当前专利权人: EMPIRE TECHNOLOGY DEVELOPMENT LLC
- 当前专利权人地址: US DE Wilmington
- 代理机构: Dorsey & Whitney LLP
- 国际申请: PCT/US2013/052868 WO 20130731
- 国际公布: WO2015/016861 WO 20150205
- 主分类号: H01L29/66
- IPC分类号: H01L29/66 ; C23C14/24 ; H01L45/00 ; C23C14/54 ; G03F7/16 ; G03F7/20 ; G03F7/32 ; H01L21/67 ; H01L29/861
摘要:
Provided herein are embodiments relating to metal-insulator-metal diodes and their method of manufacture. In some embodiments, the metal-insulator-metal diodes can be made, in part, via the use of an evanescent wave on a photo resist. In some embodiments, this allows for finer manipulation of the photo resist and allows for the separation of one piece of metal into a first and second piece of metal. The first piece of metal can then be differentially treated from the second (for example, by annealing another metal to the first piece), to allow for a difference in the work function of the two pieces of metal.
公开/授权文献
- US20160172463A1 METAL-INSULATOR-METAL DIODES AND METHODS OF FABRICATION 公开/授权日:2016-06-16
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