- 专利标题： Polylactide/silicon-containing block copolymers for nanolithography
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申请号： US14827876申请日： 2015-08-17
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公开(公告)号： US09834700B2公开(公告)日： 2017-12-05
- 发明人: Christopher J. Ellison , Carlton Grant Willson , Julia Cushen , Christopher M. Bates
- 申请人： Board of Regents, The University of Texas System
- 申请人地址： US TX Austin
- 专利权人： Board of Regents, The University of Texas System
- 当前专利权人： Board of Regents, The University of Texas System
- 当前专利权人地址： US TX Austin
- 代理机构： Medlen & Carroll, LLP
- 主分类号： C09D167/00
- IPC分类号： C09D167/00 ; B05D1/00 ; B05D3/00 ; B05D5/00 ; C08G63/695 ; B05C21/00 ; C08F112/14 ; G03F7/00 ; B82Y10/00 ; B82Y40/00 ; C08F8/02
摘要：
The present invention includes a diblock copolymer system that self-assembles at very low molecular weights to form very small features. In one embodiment, one polymer in the block copolymer contains silicon, and the other polymer is a polylactide. In one embodiment, the block copolymer is synthesized by a combination of anionic and ring opening polymerization reactions. In one embodiment, the purpose of this block copolymer is to form nanoporous materials that can be used as etch masks in lithographic patterning.
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