发明授权
- 专利标题: Illumination device and method for using the same in the projection lithography machine
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申请号: US14985086申请日: 2015-12-30
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公开(公告)号: US09804502B2公开(公告)日: 2017-10-31
- 发明人: Aijun Zeng , Yunbo Zhang , Mingxing Chen , Ying Wang , Huijie Huang
- 申请人: Shanghai Institute of Optics And Fine Mechanics, Chinese Academy of Sciences
- 申请人地址: CN Shanghai
- 专利权人: Shanghai Institute of Optics And Fine Mechanics, Chinese Academy of Sciences
- 当前专利权人: Shanghai Institute of Optics And Fine Mechanics, Chinese Academy of Sciences
- 当前专利权人地址: CN Shanghai
- 代理机构: Mei & Mark LLP
- 代理商 Manni Li
- 优先权: CN201310307405 20130719
- 主分类号: G03B27/54
- IPC分类号: G03B27/54 ; G03F7/20 ; G02B5/00 ; G02B3/00 ; G02B26/08 ; G02B26/10
摘要:
An illumination device comprises a laser source, a beam expander, a micromirror array having a first control system, a fast steering mirror having a second control system, a diaphragm array, a microlens array, an illumination lens group, and a reflection mirror sequentially along the propagation direction of the laser beam. The first control system comprises a first computer controlling each micromirror on the micro-mirror array through the micromirror array controller to rotate in two-dimensional directions so expanded beam forms desired intensity patterns on the diaphragm array after reflected by the micromirror array and fast reflection mirror and a micromirror array controller; the second control system comprises a second computer controlling the reflection mirror of the fast steering mirror to rotate through fast steering mirror controller so created intensity pattern moves relative to the diaphragm array and a fast steering mirror controller. Method for using the illumination device is provided.
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