Invention Grant
- Patent Title: Resistor and manufacturing method
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Application No.: US14920999Application Date: 2015-10-23
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Publication No.: US09793033B2Publication Date: 2017-10-17
- Inventor: Hiroyuki Fukao
- Applicant: KOA Corporation
- Applicant Address: JP Nagano
- Assignee: KOA Corporation
- Current Assignee: KOA Corporation
- Current Assignee Address: JP Nagano
- Agency: Edell, Shapiro & Finnan LLC
- Priority: JP2014-217820 20141024
- Main IPC: H01C3/10
- IPC: H01C3/10 ; H01C1/14 ; H01C17/242 ; H01C3/12 ; H01C7/10 ; H01C17/065 ; H01C17/245

Abstract:
There is provided a resistor in which a first resistive part of a resistive element that electrically conducts between a pair of electrodes formed on either end of an insulating substrate has a meandering pattern meandering on the substrate surface and a swelling pattern that has a form in which a part of the meandering pattern swells out from the stroke width of the meandering pattern, a second resistive part that is electrically connected in series to the first resistive part is shorter than the entire length of the first resistive part, and has a wider width than the stroke width of the meandering pattern, and a trimming groove is formed in at least either the swelling pattern or the second resistive part. This can improve resistance accuracy and provide a high voltage resistor with high withstand voltage property.
Public/Granted literature
- US20160118164A1 RESISTOR AND MANUFACTURING METHOD Public/Granted day:2016-04-28
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