- 专利标题： Inorganic passivation material, method for forming the same, and inorganic passivation protective film produced therefrom
-
申请号： US14305354申请日： 2014-06-16
-
公开(公告)号： US09758624B2公开(公告)日： 2017-09-12
- 发明人: Wei-Cheng Tang , Yun-Shan Huang , Ya-Tin Yu , Yi-Che Su , Yuung-Ching Sheen , Yuan-Chang Huang
- 申请人： INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- 申请人地址： TW Hsinchu
- 专利权人： INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- 当前专利权人： INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- 当前专利权人地址： TW Hsinchu
- 代理机构： Birch, Stewart, Kolasch & Birch, LLP
- 优先权： TW102149211A 20131231
- 主分类号： B05D3/00
- IPC分类号： B05D3/00 ; C08G77/395 ; C09D183/04 ; C09D183/06 ; C09D183/08 ; C08G77/30
摘要：
A method for forming an inorganic passivation material is provided. The method includes mixing about 5 to 80 parts by weight of trialkoxysilane, about 10 to 80 parts by weight of tetraalkoxysilane, and about 1 to 30 parts by weight of catalyst to perform a reaction at pH of about 0.05 to 4 to form an inorganic resin material. The inorganic resin material is modified by phosphate ester to form an inorganic passivation material, wherein phosphate ester is about 0.1-10 parts by weight based on 100 parts by weight of the inorganic resin material. An inorganic passivation material and a passivation protective film produced therefrom are also provided.
公开/授权文献
信息查询
