- 专利标题： Method of controlling a lithographic apparatus, device manufacturing method, lithographic apparatus, computer program product and method of improving a mathematical model of a lithographic process
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申请号： US13416387申请日： 2012-03-09
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公开(公告)号： US09696635B2公开(公告)日： 2017-07-04
- 发明人: Adrianus Fransiscus Petrus Engelen , Henricus Johannes Lambertus Megens , Johannes Catharinus Hubertus Mulkens , Robert Kazinczi , Jen-Shiang Wang
- 申请人： Adrianus Fransiscus Petrus Engelen , Henricus Johannes Lambertus Megens , Johannes Catharinus Hubertus Mulkens , Robert Kazinczi , Jen-Shiang Wang
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 主分类号： G03B27/54
- IPC分类号： G03B27/54 ; G03F7/20
摘要：
A method of controlling a lithographic apparatus, the method including setting an illumination system of the lithographic apparatus to effect a selected illumination mode, measuring a value of a first parameter of the lithographic apparatus, calculating a value of a second parameter of a projected image of a feature of a test pattern having a plurality of features using a model of the lithographic apparatus and the measured value of the first parameter, and controlling the lithographic apparatus with reference to the calculated value of the second parameter.
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