Invention Grant
- Patent Title: Multi charged particle beam writing method, and multi charged particle beam writing apparatus
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Application No.: US14699216Application Date: 2015-04-29
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Publication No.: US09691585B2Publication Date: 2017-06-27
- Inventor: Hiroshi Matsumoto , Munehiro Ogasawara , Ryoichi Yoshikawa
- Applicant: NuFlare Technology, Inc.
- Applicant Address: JP Yokohama
- Assignee: NuFlare Technology, Inc.
- Current Assignee: NuFlare Technology, Inc.
- Current Assignee Address: JP Yokohama
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2014-107559 20140523; JP2015-085085 20150417
- Main IPC: H01J37/147
- IPC: H01J37/147 ; H01J37/20 ; H01J37/302 ; H01J37/317 ; H01J37/04

Abstract:
A multi charged particle beam writing method includes, shifting a writing position of each corresponding beam to a next writing position by performing another beam deflection of multi charged particle beams, in addition to the beam deflection for a tracking control, while continuing the beam deflection for the tracking control after the maximum writing time has passed; emitting the each corresponding beam in the “on” state to the next writing position having been shifted of the each corresponding beam, during a corresponding writing time while continuing the tracking control; and returning a tracking position such that a next tracking start position is a former tracking start position where the tracking control was started, by resetting the beam deflection for the tracking control after emitting the each corresponding beam to the next writing position having been shifted at least once of the each corresponding beam while continuing the tracking control.
Public/Granted literature
- US20150340196A1 MULTI CHARGED PARTICLE BEAM WRITING METHOD, AND MULTI CHARGED PARTICLE BEAM WRITING APPARATUS Public/Granted day:2015-11-26
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