- 专利标题: Reflow film, solder bump formation method, solder joint formation method, and semiconductor device
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申请号: US14353495申请日: 2012-10-26
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公开(公告)号: US09656353B2公开(公告)日: 2017-05-23
- 发明人: Kazuhiro Miyauchi , Naoya Suzuki , Nozomu Takano , Yukihiko Yamashita
- 申请人: Hitachi Chemical Company, Ltd.
- 申请人地址: JP Tokyo
- 专利权人: HITACHI CHEMICAL COMPANY, LTD.
- 当前专利权人: HITACHI CHEMICAL COMPANY, LTD.
- 当前专利权人地址: JP Tokyo
- 代理机构: Fitch, Even, Tabin & Flannery, LLP
- 优先权: JP2011-235479 20111026; JP2011-235484 20111026; JP2011-235489 20111026
- 国际申请: PCT/JP2012/077759 WO 20121026
- 国际公布: WO2013/062095 WO 20130502
- 主分类号: H01L23/00
- IPC分类号: H01L23/00 ; H01L23/498 ; B23K35/362 ; B23K35/26 ; C22C12/00 ; C22C13/00 ; C22C28/00 ; B23K35/02 ; H01L21/48 ; H01L23/488 ; H01L21/56 ; H05K3/34 ; B23K1/00 ; B23K1/06 ; B23K35/30 ; B23K35/36 ; B23K1/012 ; B23K1/20 ; B23K101/40 ; B23K101/42
摘要:
The present invention relates to a reflow film containing a thermoplastic resin which is dissolvable in a solvent, and solder particles, wherein the solder particles are dispersed in the film, and also relates to a solder bump formation method which comprises: (A) a step of mounting the reflow film on the electrode surface side of a substrate, (B) a step of mounting and fixing a flat plate, (C) a step of heating, and (D) a step of dissolving and removing the reflow film, and herewith, a reflow film is provided which, by causing localization of the solder component on the electrodes of the substrate by self-assembly, exhibits excellent storage properties, transportability and handling properties during use, and can form solder bumps or solder joints selectively on only the electrodes.
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