- 专利标题： Nanoscale chemical templating with oxygen reactive materials
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申请号： US14797945申请日： 2015-07-13
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公开(公告)号： US09647063B2公开(公告)日： 2017-05-09
- 发明人: Maha M. Khayyat , Devendra K. Sadana , Brent A. Wacaser
- 申请人： GLOBALFOUNDRIES INC. , King Abdulaziz City for Science and Technology
- 申请人地址： KY Grand Cayman SA Riyadh
- 专利权人： GLOBALFOUNDRIES INC.,KING ABDULAZIZ CITY FOR SCIENCE AND TECHNOLOGY
- 当前专利权人： GLOBALFOUNDRIES INC.,KING ABDULAZIZ CITY FOR SCIENCE AND TECHNOLOGY
- 当前专利权人地址： KY Grand Cayman SA Riyadh
- 代理机构： Scully, Scott, Murphy & Presser, P.C.
- 主分类号： H01L29/20
- IPC分类号： H01L29/20 ; H01L29/06 ; H01L21/20 ; H01L21/30 ; H01L29/66 ; H01L29/02
摘要：
A method of fabricating templated semiconductor nanowires on a surface of a semiconductor substrate for use in semiconductor device applications is provided. The method includes controlling the spatial placement of the semiconductor nanowires by using an oxygen reactive seed material. The present invention also provides semiconductor structures including semiconductor nanowires. In yet another embodiment, patterning of a compound semiconductor substrate or other like substrate which is capable of forming a compound semiconductor alloy with an oxygen reactive element during a subsequent annealing step is provided. This embodiment provides a patterned substrate that can be used in various applications including, for example, in semiconductor device manufacturing, optoelectronic device manufacturing and solar cell device manufacturing.
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