Invention Grant
- Patent Title: Capacitive micromachined ultrasonic transducer and method of fabricating the same
- Patent Title (中): 电容式微加工超声波换能器及其制造方法
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Application No.: US14280725Application Date: 2014-05-19
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Publication No.: US09596528B2Publication Date: 2017-03-14
- Inventor: Dong-sik Shim , Seog-woo Hong , Seok-whan Chung , Chang-jung Kim
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Agency: Sughrue Mion, PLLC
- Priority: KR10-2013-0150162 20131204
- Main IPC: H04R1/00
- IPC: H04R1/00 ; H01L21/768 ; H01L21/304 ; H01L23/48 ; H01L21/02 ; B06B1/02

Abstract:
A capacitive micromachined ultrasonic transducer includes a device substrate including a first trench confining a plurality of first parts corresponding to a plurality of elements and a second trench confining a second part separated from the plurality of first parts, a supporting unit provided on the device substrate for confining a plurality of cavities corresponding to each of the plurality of elements, a membrane provided on the supporting unit to cover the plurality of cavities, an upper electrode provided on the membrane and electrically connected to the second part in the second trench through a via hole passing through the membrane and the supporting unit, and a through-silicon via (TSV) substrate provided on a lower surface of the device substrate, and including a plurality of first via metals connected to the plurality of first parts and a second via metal connected to the second part.
Public/Granted literature
- US20150156571A1 CAPACITIVE MICROMACHINED ULTRASONIC TRANSDUCER AND METHOD OF FABRICATING THE SAME Public/Granted day:2015-06-04
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