发明授权
- 专利标题: Vertical gate NAND memory devices
- 专利标题(中): 垂直门NAND存储器件
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申请号: US14314622申请日: 2014-06-25
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公开(公告)号: US09570459B2公开(公告)日: 2017-02-14
- 发明人: Bruce Lynn Bateman
- 申请人: Unity Semiconductor Corporation
- 申请人地址: US CA Sunnyvale
- 专利权人: UNITY SEMICONDUCTOR CORPORATION
- 当前专利权人: UNITY SEMICONDUCTOR CORPORATION
- 当前专利权人地址: US CA Sunnyvale
- 代理机构: Lowenstein Sandler LLP
- 主分类号: H01L29/76
- IPC分类号: H01L29/76 ; H01L27/115 ; H01L29/66 ; H01L29/792 ; G11C16/04 ; G11C16/34
摘要:
In an example, a device comprises a vertical stack of memory cells. Each memory cell of the vertical stack may include more than one memory element. A first vertical gate line may be coupled to a first one of the memory elements in each memory cell, and a second vertical gate line may be coupled to a second one of the memory elements in each memory cell. The first vertical gate line may be electrically isolated from the second vertical gate line.
公开/授权文献
- US20150014760A1 VERTICAL GATE NAND MEMORY DEVICES 公开/授权日:2015-01-15
信息查询
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