Invention Grant
US09562123B2 Photocurable composition, barrier layer including same, and encapsulated device including same
有权
光固化性组合物，包含其的阻隔层，以及包含其的封装装置
- Patent Title: Photocurable composition, barrier layer including same, and encapsulated device including same
- Patent Title (中): 光固化性组合物，包含其的阻隔层，以及包含其的封装装置
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Application No.: US14385920Application Date: 2013-02-22
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Publication No.: US09562123B2Publication Date: 2017-02-07
- Inventor: Chang Min Lee , Seung Jib Choi , Ji Hye Kwon , Yeon Soo Lee , Kyoung Jin Ha
- Applicant: Chang Min Lee , Seung Jib Choi , Ji Hye Kwon , Yeon Soo Lee , Kyoung Jin Ha
- Applicant Address: KR Gumi-Si, Kyeongsangbuk
- Assignee: Cheil Industries, Inc.
- Current Assignee: Cheil Industries, Inc.
- Current Assignee Address: KR Gumi-Si, Kyeongsangbuk
- Agency: Lee & Morse, P.C.
- Priority: KR10-2012-0064371 20120615; KR10-2013-0004179 20130114
- International Application: PCT/KR2013/001423 WO 20130222
- International Announcement: WO2013/187577 WO 20131219
- Main IPC: C08F222/10
- IPC: C08F222/10 ; C08L83/08 ; C09D133/00 ; C08L33/00 ; C08G77/14 ; C08G77/20 ; H01L51/44 ; H01L51/52
Abstract:
The present invention relates to a photocurable composition, to a barrier layer including same, and to an encapsulated device including same, wherein the composition comprises a photocurable monomer(A) and a silicon containing monomer(B), wherein the silicon containing monomers(B) has a structure according to Formula 1.
Public/Granted literature
- US20150079332A1 PHOTOCURABLE COMPOSITION, BARRIER LAYER INCLUDING SAME, AND ENCAPSULATED DEVICE INCLUDING SAME Public/Granted day:2015-03-19
Information query
IPC分类:
