发明授权
- 专利标题： Substrate liquid processing apparatus
- 专利标题（中）： 基板液体处理装置
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申请号： US14882864申请日： 2015-10-14
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公开(公告)号： US09508569B2公开(公告)日： 2016-11-29
- 发明人: Shigehisa Inoue , Jiro Higashijima , Masami Akimoto
- 申请人： Tokyo Electron Limited
- 申请人地址： JP Tokyo
- 专利权人： Tokyo Electron Limited
- 当前专利权人： Tokyo Electron Limited
- 当前专利权人地址： JP Tokyo
- 代理机构： Abelman, Frayne & Schwab
- 优先权： JP2014-214944 20141022
- 主分类号： H01L21/67
- IPC分类号： H01L21/67 ; B08B3/12 ; B08B3/04 ; B05B15/02 ; B08B3/02
摘要：
Disclosed is a substrate liquid processing apparatus including a substrate holding unit configured to hold a substrate; a processing liquid nozzle configured to supply a processing liquid to the substrate held by the substrate holding unit; a nozzle arm configured to hold the processing liquid nozzle; and an arm cleaning tank configured to immerse the entire surface of the nozzle arm in a cleaning liquid so as to clean the nozzle arm.
公开/授权文献
- US20160118275A1 SUBSTRATE LIQUID PROCESSING APPARATUS 公开/授权日：2016-04-28
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