Invention Grant
US09449919B2 Semiconductor device, layout design and method for manufacturing a semiconductor device 有权
半导体器件,布局设计和制造半导体器件的方法

Semiconductor device, layout design and method for manufacturing a semiconductor device
Abstract:
A semiconductor device includes a first interconnect structure. The first interconnect structure includes a first interconnect portion, a second interconnect portion and a third interconnect portion. The first interconnect portion has a width and a length. The second interconnect portion has a width less than the length of the first interconnect portion. The second interconnect portion is connected to the first interconnect portion. The third interconnect portion has a width less than the width of the second interconnect portion. The third interconnect portion is connected to the second interconnect portion.
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