Invention Grant
US09449919B2 Semiconductor device, layout design and method for manufacturing a semiconductor device
有权
半导体器件,布局设计和制造半导体器件的方法
- Patent Title: Semiconductor device, layout design and method for manufacturing a semiconductor device
- Patent Title (中): 半导体器件,布局设计和制造半导体器件的方法
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Application No.: US14621067Application Date: 2015-02-12
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Publication No.: US09449919B2Publication Date: 2016-09-20
- Inventor: Jian-Hong Lin , Hsin-Chun Chang , Shiou-Fan Chen , Chwei-Ching Chiu , Yung-Huei Lee
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Applicant Address: TW
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee Address: TW
- Agency: Hauptman Ham, LLP
- Main IPC: H01L23/528
- IPC: H01L23/528 ; H01L23/522 ; G06F17/50 ; H01L21/768

Abstract:
A semiconductor device includes a first interconnect structure. The first interconnect structure includes a first interconnect portion, a second interconnect portion and a third interconnect portion. The first interconnect portion has a width and a length. The second interconnect portion has a width less than the length of the first interconnect portion. The second interconnect portion is connected to the first interconnect portion. The third interconnect portion has a width less than the width of the second interconnect portion. The third interconnect portion is connected to the second interconnect portion.
Public/Granted literature
- US20160240472A1 SEMICONDUCTOR DEVICE, LAYOUT DESIGN AND METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE Public/Granted day:2016-08-18
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