Invention Grant
- Patent Title: Systems, methods and apparatus for choked flow element extraction
- Patent Title (中): 阻塞流动元件提取的系统,方法和装置
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Application No.: US12852375Application Date: 2010-08-06
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Publication No.: US09449793B2Publication Date: 2016-09-20
- Inventor: Ali Shajii , Richard Gottscho , Souheil Benzerrouk , Andrew Cowe , Siddharth P. Nagarkatti , William R. Entley
- Applicant: Ali Shajii , Richard Gottscho , Souheil Benzerrouk , Andrew Cowe , Siddharth P. Nagarkatti , William R. Entley
- Applicant Address: US CA Fremont
- Assignee: Lam Research Corporation
- Current Assignee: Lam Research Corporation
- Current Assignee Address: US CA Fremont
- Agency: Martine Penilla Group, LLP
- Main IPC: H01L21/3065
- IPC: H01L21/3065 ; H01J37/32

Abstract:
A plasma source includes a ring plasma chamber, a primary winding around an exterior of the ring plasma chamber, multiple ferrites, wherein the ring plasma chamber passes through each of the ferrites and multiple plasma chamber outlets coupling the plasma chamber to a process chamber. Each one of the plasma chamber outlets having a respective plasma restriction. A system and method for generating a plasma are also described.
Public/Granted literature
- US20120035766A1 SYSTEMS, METHODS AND APPARATUS FOR CHOKED FLOW ELEMENT EXTRACTION Public/Granted day:2012-02-09
Information query
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