发明授权
- 专利标题： Soft landing nanolaminates for advanced patterning
- 专利标题（中）： 用于高级图案的软着陆的Nanolaminates
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申请号： US14194324申请日： 2014-02-28
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公开(公告)号： US09390909B2公开(公告)日： 2016-07-12
- 发明人: Frank L. Pasquale , Shankar Swaminathan , Adrien LaVoie , Nader Shamma , Girish Dixit
- 申请人： Novellus Systems, Inc.
- 申请人地址： US CA Fremont
- 专利权人： Novellus Systems, Inc.
- 当前专利权人： Novellus Systems, Inc.
- 当前专利权人地址： US CA Fremont
- 代理机构： Weaver Austin Villeneuve & Sampson, LLP
- 主分类号： H01L21/00
- IPC分类号： H01L21/00 ; H01L21/02 ; C23C16/34 ; C23C16/40 ; C23C16/455 ; H01L21/66 ; H01L21/033
摘要：
Methods for depositing nanolaminate protective layers over a core layer to enable deposition of high quality conformal films over the core layer for use in advanced multiple patterning schemes are provided. In certain embodiments, the methods involve depositing a thin silicon oxide or titanium oxide film using plasma-based atomic layer deposition techniques with a low high frequency radio frequency (HFRF) plasma power, followed by depositing a conformal titanium oxide film or spacer with a high HFRF plasma power.
公开/授权文献
- US20150126042A1 SOFT LANDING NANOLAMINATES FOR ADVANCED PATTERNING 公开/授权日：2015-05-07
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