发明授权
- 专利标题: Fluid handling device
- 专利标题(中): 流体处理装置
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申请号: US14731491申请日: 2015-06-05
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公开(公告)号: US09387477B2公开(公告)日: 2016-07-12
- 发明人: Koichi Ono , Ken Kitamoto
- 申请人: Enplas Corporation
- 申请人地址: JP Saitama
- 专利权人: Enplas Corporation
- 当前专利权人: Enplas Corporation
- 当前专利权人地址: JP Saitama
- 代理机构: Brundidge & Stanger, P.C.
- 优先权: JP2014-123551 20140616
- 主分类号: B01L3/00
- IPC分类号: B01L3/00 ; G01N15/06 ; G01N33/00 ; G01N33/48
摘要:
A fluid handling device includes a substrate, a film and a conductive layer. The substrate includes a through hole or a recess. The film includes first, second and third regions. The conductive layer is disposed on one surface of the film across the first, second and third regions. The first region of the film is bonded to one surface of the substrate such that one of openings of the through hole or an opening of the recess is closed to form a housing part, and that a part of the conductive layer is exposed to the inside of the housing part. The second region of the film is bent such that the conductive layer is located on an outside. The third region of the film is bonded to the first region of the film such that the conductive layer is exposed to the exterior.
公开/授权文献
- US20150360223A1 FLUID HANDLING DEVICE 公开/授权日:2015-12-17
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