发明授权
US09336892B1 Reducing hot electron injection type of read disturb in 3D non-volatile memory
有权
在3D非易失性存储器中减少热电子注入类型的读取干扰
- 专利标题: Reducing hot electron injection type of read disturb in 3D non-volatile memory
- 专利标题(中): 在3D非易失性存储器中减少热电子注入类型的读取干扰
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申请号: US14728615申请日: 2015-06-02
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公开(公告)号: US09336892B1公开(公告)日: 2016-05-10
- 发明人: Hong-Yan Chen , Yingda Dong , Charles Kwong
- 申请人: SanDisk Technologies Inc.
- 申请人地址: US TX Plano
- 专利权人: SanDisk Technologies Inc.
- 当前专利权人: SanDisk Technologies Inc.
- 当前专利权人地址: US TX Plano
- 代理机构: Vierra Magen Marcus LLP
- 主分类号: G11C11/34
- IPC分类号: G11C11/34 ; G11C16/04 ; G11C16/34 ; G11C16/26
摘要:
Read disturb due to hot electron injection is reduced in a 3D memory device by controlling the magnitude and timing of word line and select gate ramp down voltages at the end of a sensing operation. In an example read operation, the magnitude of a selected word line voltage is increased to be equal to pass voltages of unselected word lines, and the selected and unselected word line are ramped down at the same time, to avoid creating a channel gradient. In an example verify operation, the above procedure can be followed when the selected word line is at a source-side or middle range among all word lines. When the selected word line is at a drain-side among all word lines, a source-side select gate can be ramped down before the selected word line and a drain-side select gate can be ramped down after the selected word line.
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