发明授权
- 专利标题: Hetero junction field effect transistor and method for manufacturing the same
- 专利标题(中): 异质结场效应晶体管及其制造方法
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申请号: US14062284申请日: 2013-10-24
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公开(公告)号: US09306049B2公开(公告)日: 2016-04-05
- 发明人: JaeHoon Lee , Chanho Park , NamYoung Lee
- 申请人: Samsung Electronics Co., Ltd.
- 申请人地址: KR
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR
- 代理机构: Onello & Mello, LLP
- 优先权: KR10-2012-0133194 20121122
- 主分类号: H01L29/66
- IPC分类号: H01L29/66 ; H01L29/778 ; H01L29/423 ; H01L29/06 ; H01L29/10 ; H01L29/20
摘要:
Hetero junction field effect transistors and methods of fabricating such transistors are disclosed wherein: a first compound semiconductor layer is provided on a substrate; a second compound semiconductor layer is provided on the first compound semiconductor layer; a gate insulating layer is provided on the second compound semiconductor layer; and a gate electrode is provided on the gate insulating layer such that the gate insulating layer penetrates the second compound semiconductor layer so as to be in contact with the first compound semiconductor layer.
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