Invention Grant
- Patent Title: Inspection or observation apparatus and sample inspection or observation method
- Patent Title (中): 检验或观察仪器和样品检查或观察方法
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Application No.: US14562260Application Date: 2014-12-05
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Publication No.: US09236217B2Publication Date: 2016-01-12
- Inventor: Yusuke Ominami , Mami Konomi , Sukehiro Ito , Tomohisa Ohtaki , Shinsuke Kawanishi
- Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
- Applicant Address: JP Tokyo
- Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
- Current Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: McDermott Will & Emery LLP
- Priority: JP2011-220606 20111005
- Main IPC: H01J37/00
- IPC: H01J37/00 ; H01J37/18 ; H01J37/16 ; H01J37/22 ; H01J37/28 ; H01J37/20 ; H01J37/26

Abstract:
A sample observation method uses a charged particle beam apparatus comprising a charged particle optical column irradiating a charged particle beam, a vacuum chamber, and a sample chamber being capable of storing a sample. The method includes maintaining a pressure of the sample chamber higher than that of the vacuum chamber by a thin film which permits the charged particle beam to be transmitted, determining a relation between a height of a lower surface of the thin film and a height of a lower end of a lens barrel of an optical microscope, measuring a distance between the sample and the lens barrel, and setting a distance between the sample and thin film based on the relation and the distance.
Public/Granted literature
- US20150083908A1 INSPECTION OR OBSERVATION APPARATUS AND SAMPLE INSPECTION OR OBSERVATION METHOD Public/Granted day:2015-03-26
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