Invention Grant
- Patent Title: Methods of providing patterned chemical epitaxy templates for self-assemblable block copolymers for use in device lithography
- Patent Title (中): 提供用于装置光刻的自组装嵌段共聚物的图案化化学外延模板的方法
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Application No.: US14380911Application Date: 2013-02-06
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Publication No.: US09235125B2Publication Date: 2016-01-12
- Inventor: Emiel Peeters , Wilhelmus Sebastianus Marcus Maria Ketelaars , Sander Frederik Wuister , Roelof Koole , Christianus Martinus Van Heesch , Aurelie Marie Andree Brizard , Henri Marie Joseph Boots , Thanh Trung Nguyen , Oktay Yildirim
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- International Application: PCT/EP2013/052306 WO 20130206
- International Announcement: WO2013/127608 WO 20130906
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F7/038 ; G03F7/00 ; B82Y10/00 ; B82Y40/00

Abstract:
A method of forming a patterned chemical epitaxy template, for orientation of a self-assemblable block copolymer including first and second polymer blocks, on a surface of a substrate, the method including applying a primer layer of a primer composition to the surface, the primer composition including a first polymer moiety having a chemical affinity with the first polymer blocks and a second polymer moiety having a chemical affinity with the second polymer blocks, selectively exposing the surface, the primer layer and any overlying layer to actinic radiation to provide exposed and unexposed regions, to render labile the first polymer moiety in the exposed region, and removing the labile first polymer moiety from the exposed region to deplete the primer layer surface in the exposed region of first polymer moiety to form the patterned chemical epitaxy template.
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