Invention Grant
US09196474B2 Metal amide deposition precursors and their stabilization with an inert ampoule liner
有权
金属酰胺沉积前体及其与惰性安瓿内胆的稳定性
- Patent Title: Metal amide deposition precursors and their stabilization with an inert ampoule liner
- Patent Title (中): 金属酰胺沉积前体及其与惰性安瓿内胆的稳定性
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Application No.: US14193088Application Date: 2014-02-28
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Publication No.: US09196474B2Publication Date: 2015-11-24
- Inventor: David Knapp , David Thompson
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Servilla Whitney LLC
- Main IPC: H01L21/31
- IPC: H01L21/31 ; H01L21/02 ; C23C16/34 ; C23C16/448 ; C23C16/455
Abstract:
Described are methods and apparatuses for the stabilization of precursors, which can be used for the deposition of manganese-containing films. Certain methods and apparatus relate to lined ampoules and/or 2-electron donor ligands.
Public/Granted literature
- US20140242806A1 Metal Amide Deposition Precursors And Their Stabilization With An Inert Ampoule Liner Public/Granted day:2014-08-28
Information query
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