Invention Grant
- Patent Title: Illumination optical apparatus, exposure apparatus, and device manufacturing method
- Patent Title (中): 照明光学装置,曝光装置和装置的制造方法
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Application No.: US11783561Application Date: 2007-04-10
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Publication No.: US09195069B2Publication Date: 2015-11-24
- Inventor: Hirohisa Tanaka , Hideki Komatsuda
- Applicant: Hirohisa Tanaka , Hideki Komatsuda
- Applicant Address: JP Tokyo
- Assignee: NIKON CORPORATION
- Current Assignee: NIKON CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JPP2006-112883 20060417
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G03B27/44 ; G03B27/72 ; G03B27/32 ; G02B27/09 ; G03F7/20 ; G03B27/68 ; G03B27/42 ; G03B27/52

Abstract:
An illumination optical apparatus has a beam splitting member which splits an incident beam into a first light beam and a second light beam to form a first illumination region and a second illumination region, a first light-guide optical system which guides the first light beam to the first illumination region, and a second light-guide optical system which guides the second light beam to the second illumination region locate apart from the first illumination region.
Public/Granted literature
- US20070258077A1 Illumination optical apparatus, exposure apparatus, and device manufacturing method Public/Granted day:2007-11-08
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