发明授权
US09163325B2 Crystal growth apparatus and manufacturing method of group III nitride crystal
有权
晶体生长装置及III族氮化物晶体的制造方法
- 专利标题: Crystal growth apparatus and manufacturing method of group III nitride crystal
- 专利标题(中): 晶体生长装置及III族氮化物晶体的制造方法
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申请号: US13313359申请日: 2011-12-07
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公开(公告)号: US09163325B2公开(公告)日: 2015-10-20
- 发明人: Seiji Sarayama , Hirokazu Iwata , Akihiro Fuse
- 申请人: Seiji Sarayama , Hirokazu Iwata , Akihiro Fuse
- 申请人地址: JP Tokyo
- 专利权人: RICOH COMPANY, LTD.
- 当前专利权人: RICOH COMPANY, LTD.
- 当前专利权人地址: JP Tokyo
- 代理机构: Oblon, McClelland, Maier & Neustadt, L.L.P.
- 优先权: JP2005-300446 20051014; JP2005-300550 20051014; JP2005-335108 20051121; JP2005-335170 20051121; JP2005-335430 20051121; JP2005-360174 20051214
- 主分类号: C30B29/40
- IPC分类号: C30B29/40 ; C30B9/00 ; C30B17/00
摘要:
A crystal growth apparatus comprises a reaction vessel holding a melt mixture containing an alkali metal and a group III metal, a gas supplying apparatus supplying a nitrogen source gas to a vessel space exposed to the melt mixture inside the reaction vessel, a heating unit heating the melt mixture to a crystal growth temperature, and a support unit supporting a seed crystal of a group III nitride crystal inside the melt mixture.
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