发明授权
- 专利标题: Magnetoresistance effect element and magnetic memory
- 专利标题(中): 磁阻效应元件和磁存储器
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申请号: US13701257申请日: 2011-05-26
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公开(公告)号: US09135973B2公开(公告)日: 2015-09-15
- 发明人: Hideo Ohno , Shoji Ikeda , Fumihiro Matsukura , Masaki Endoh , Shun Kanai , Katsuya Miura , Hiroyuki Yamamoto
- 申请人: Hideo Ohno , Shoji Ikeda , Fumihiro Matsukura , Masaki Endoh , Shun Kanai , Katsuya Miura , Hiroyuki Yamamoto
- 申请人地址: JP Miyagi
- 专利权人: TOHOKU UNIVERSITY
- 当前专利权人: TOHOKU UNIVERSITY
- 当前专利权人地址: JP Miyagi
- 代理机构: Baker Botts L.L.P.
- 优先权: JP2010-128051 20100603
- 国际申请: PCT/JP2011/062119 WO 20110526
- 国际公布: WO2011/152281 WO 20111208
- 主分类号: G11C11/16
- IPC分类号: G11C11/16 ; H01L43/08 ; H01L43/02 ; G11C11/14 ; H01L27/22
摘要:
Provided are a magnetoresistance effect element with a stable magnetization direction perpendicular to film plane and a controlled magnetoresistance ratio, in which writing can be performed by magnetic domain wall motion, and a magnetic memory including the magnetoresistance effect element. The magnetoresistance ratio is controlled by forming a ferromagnetic layer of the magnetoresistance effect element from a ferromagnetic material including at least one type of 3d transition metal or a Heusler alloy. The magnetization direction is changed from a direction in the film plane to a direction perpendicular to the film plane by controlling the film thickness of the ferromagnetic layer on an atomic layer level.
公开/授权文献
- US20130141966A1 MAGNETORESISTANCE EFFECT ELEMENT AND MAGNETIC MEMORY 公开/授权日:2013-06-06
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