Invention Grant
- Patent Title: Method and board for growing high-quality graphene layer using high pressure annealing
- Patent Title (中): 使用高压退火生长高质量石墨烯层的方法和板
-
Application No.: US14132071Application Date: 2013-12-18
-
Publication No.: US09129811B2Publication Date: 2015-09-08
- Inventor: Byung Jin Cho , Jeong Hun Mun
- Applicant: Korea Advanced Institute of Science and Technology
- Applicant Address: KR Daejeon
- Assignee: Korea Advanced Instittute of Science and Technology
- Current Assignee: Korea Advanced Instittute of Science and Technology
- Current Assignee Address: KR Daejeon
- Agency: The Webb Law Firm
- Priority: KR10-2013-0037436 20130405
- Main IPC: H01L21/20
- IPC: H01L21/20 ; H01L21/02 ; H01L29/16 ; H01L45/00

Abstract:
This invention relates to a method and board for forming a graphene layer, and more particularly, to a method of forming a high-quality graphene layer using high pressure annealing and to a board used therein. The method of forming the graphene layer includes forming a reaction barrier layer on a substrate layer, forming a metal catalyst layer which functions as a catalyst for forming the graphene layer on the reaction barrier layer, subjecting a board including a stack of the layers to high pressure annealing, and growing the graphene layer on the metal catalyst layer. This board is subjected to high pressure annealing before growth of the graphene layer, and the reaction barrier layer is formed using a material having high adhesion energy to the metal catalyst layer so as to suppress migration of metal catalyst atoms.
Public/Granted literature
- US20140299975A1 Method and Board for Growing High-Quality Graphene Layer Using High Pressure Annealing Public/Granted day:2014-10-09
Information query
IPC分类: