发明授权
- 专利标题： Apparatus and method for providing uniform flow of gas
- 专利标题（中）： 提供气体均匀流动的装置和方法
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申请号： US13653952申请日： 2012-10-17
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公开(公告)号： US09109754B2公开(公告)日： 2015-08-18
- 发明人: Joseph Yudovsky , Mei Chang , Faruk Gungor , Paul F. Ma , David Chu , Chien-Teh Kao , Hyman Lam , Dien-Yeh Wu
- 申请人： Applied Materials, Inc.
- 申请人地址： US CA Santa Clara
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： US CA Santa Clara
- 代理机构： Servilla Whitney LLC
- 主分类号： F16K11/20
- IPC分类号： F16K11/20 ; F17D3/00
摘要：
Provided are gas distribution apparatus with a delivery channel having an inlet end, an outlet end and a plurality of apertures spaced along the length. The inlet end is connectable to an inlet gas source and the outlet end is connectable with a vacuum source. Also provided are gas distribution apparatus with spiral delivery channels, intertwined spiral delivery channels, splitting delivery channels, merging delivery channels and shaped delivery channels in which an inlet end and outlet end are configured for rapid exchange of gas within the delivery channels.
公开/授权文献
- US20130098477A1 Apparatus and Method for Providing Uniform Flow of Gas 公开/授权日：2013-04-25
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