Invention Grant
US09102035B2 Method for machining seed rods for use in a chemical vapor deposition polysilicon reactor
有权
用于化学气相沉积多晶硅反应器的种子棒的加工方法
- Patent Title: Method for machining seed rods for use in a chemical vapor deposition polysilicon reactor
- Patent Title (中): 用于化学气相沉积多晶硅反应器的种子棒的加工方法
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Application No.: US13417792Application Date: 2012-03-12
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Publication No.: US09102035B2Publication Date: 2015-08-11
- Inventor: Rodolfo Bovo , Paolo Molino
- Applicant: Rodolfo Bovo , Paolo Molino
- Applicant Address: IT Novara
- Assignee: MEMC Electronics Materials S.p.A.
- Current Assignee: MEMC Electronics Materials S.p.A.
- Current Assignee Address: IT Novara
- Agency: Armstrong Teasdale LLP
- Main IPC: B24B49/12
- IPC: B24B49/12 ; B24B41/06 ; B24B1/00 ; B24B19/00 ; B24B7/16
Abstract:
A method for machining a profile into a silicon seed rod using a machine. The silicon seed rod is capable of being used in a chemical vapor deposition polysilicon reactor. The machine includes a plurality of grinding wheels. The method includes grinding a v-shaped profile into a first end of the silicon seed rod with one of the plurality of grinding wheels and grinding a conical profile in a second end of the silicon seed rod with another of the plurality of grinding wheels.
Public/Granted literature
- US20130237126A1 System For Machining Seed Rods For Use In A Chemical Vapor Deposition Polysilicon Reactor Public/Granted day:2013-09-12
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