Invention Grant
US08994082B2 Transistors, methods of manufacturing thereof, and image sensor circuits with reduced RTS noise
有权
晶体管,其制造方法和具有减少的RTS噪声的图像传感器电路
- Patent Title: Transistors, methods of manufacturing thereof, and image sensor circuits with reduced RTS noise
- Patent Title (中): 晶体管,其制造方法和具有减少的RTS噪声的图像传感器电路
-
Application No.: US13250856Application Date: 2011-09-30
-
Publication No.: US08994082B2Publication Date: 2015-03-31
- Inventor: Feng-Chi Hung , Jhy-Jyi Sze , Shou-Gwo Wuu
- Applicant: Feng-Chi Hung , Jhy-Jyi Sze , Shou-Gwo Wuu
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Slater & Matsil, L.L.P.
- Main IPC: H01L31/062
- IPC: H01L31/062 ; H01L31/113 ; H01L21/265 ; H01L29/78 ; H01L27/146 ; H01L21/28

Abstract:
Transistors, methods of manufacturing thereof, and image sensor circuits with reduced random telegraph signal (RTS) noise are disclosed. In one embodiment, a transistor includes a channel disposed between two isolation regions in a workpiece. The channel has edge regions proximate the isolation regions and a central region between the edge regions. The transistor includes a gate dielectric disposed over the channel, and a gate disposed over the gate dielectric. The transistor includes a voltage threshold modification feature proximate the edge regions configured to increase a voltage threshold of the transistor proximate edge regions relative to the central region of the channel.
Public/Granted literature
- US20130082312A1 Transistors, Methods of Manufacturing Thereof, and Image Sensor Circuits with Reduced RTS Noise Public/Granted day:2013-04-04
Information query
IPC分类: