发明授权
US08965102B2 System and method for defect analysis of a substrate 有权
衬底缺陷分析系统和方法

System and method for defect analysis of a substrate
摘要:
The present disclosure provides a method including providing a first image and a second image. The first image is of a substrate having a defect and the second image is of a reference substrate. A difference between the first image and the second image is determined. A simulation model is used to generate a simulation curve corresponding to the difference and the substrate dispositioned based on the simulation curve. In another embodiment, the scan of a substrate is used to generate a statistical process control chart.
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