发明授权
US08963081B2 Mass selector, and ion gun, ion irradiation apparatus and mass microscope
有权
质量选择器和离子枪,离子照射装置和质量显微镜
- 专利标题: Mass selector, and ion gun, ion irradiation apparatus and mass microscope
- 专利标题(中): 质量选择器和离子枪,离子照射装置和质量显微镜
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申请号: US14190289申请日: 2014-02-26
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公开(公告)号: US08963081B2公开(公告)日: 2015-02-24
- 发明人: Kota Iwasaki
- 申请人: Canon Kabushiki Kaisha
- 申请人地址: JP Tokyo
- 专利权人: Canon Kabushiki Kaisha
- 当前专利权人: Canon Kabushiki Kaisha
- 当前专利权人地址: JP Tokyo
- 代理机构: Fitzpatrick, Cella, Harper & Scinto
- 优先权: JP2013-043801 20130306
- 主分类号: H01J49/40
- IPC分类号: H01J49/40 ; H01J49/06
摘要:
When a time-of-flight mass selector having a chopper using a deflector selects the masses of the ions, an ion beam is deflected. As a result, at least a part of the ion beams diagonally pass through an aperture electrode with respect to the axis. Accordingly, there has been a problem that a position on an object irradiated with a cluster ion beam, results in moving. This mass selector includes: a flight tube having an equipotential space that makes a charged substance fly therein; a deflector that is installed in a downstream side with respect to the flight tube in a direction in which the charged substance flies; a first aperture electrode that is installed in a downstream side with respect to the deflector in a direction in which the charged substance flies; and a second aperture electrode that is installed in between the deflector and the first aperture electrode.
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