发明授权
- 专利标题: Semiconductor device
- 专利标题(中): 半导体器件
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申请号: US13543069申请日: 2012-07-06
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公开(公告)号: US08912596B2公开(公告)日: 2014-12-16
- 发明人: Shunpei Yamazaki
- 申请人: Shunpei Yamazaki
- 申请人地址: JP Atsugi-shi, Kanagawa-ken
- 专利权人: Semiconductor Energy Laboratory Co., Ltd.
- 当前专利权人: Semiconductor Energy Laboratory Co., Ltd.
- 当前专利权人地址: JP Atsugi-shi, Kanagawa-ken
- 代理机构: Robinson Intellectual Property Law Office, P.C.
- 代理商 Eric J. Robinson
- 优先权: JP2011-156225 20110715
- 主分类号: H01L29/66
- IPC分类号: H01L29/66 ; H01L29/423 ; H01L29/45 ; H01L29/786
摘要:
A transistor used for a semiconductor device for high power application needs to have a channel region for obtaining higher drain current. As an example of such a transistor, a vertical (trench type) transistor has been considered; however, the vertical transistor cannot have a high on/off ratio of drain current and thus cannot have favorable transistor characteristics. Over a substrate having conductivity, an oxide semiconductor layer having a surface having a dotted pattern of a plurality of island-shaped regions with a tapered shape in a cross section is sandwiched between a first electrode formed between the substrate and the oxide semiconductor layer and a second electrode formed over the oxide semiconductor layer, and a conductive layer functioning as a gate electrode is formed on the side surface of the island-shaped region in the oxide semiconductor layer with an insulating layer provided therebetween.
公开/授权文献
- US20130015436A1 SEMICONDUCTOR DEVICE 公开/授权日:2013-01-17
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