Invention Grant
- Patent Title: Cleaning formulations and method of using the cleaning formulations
- Patent Title (中): 清洁配方和使用清洁配方的方法
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Application No.: US13414339Application Date: 2012-03-07
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Publication No.: US08889609B2Publication Date: 2014-11-18
- Inventor: Aiping Wu , Yi-Chia Lee , Wen Dar Liu , Machukar Bhaskara Rao , Gautam Banerjee
- Applicant: Aiping Wu , Yi-Chia Lee , Wen Dar Liu , Machukar Bhaskara Rao , Gautam Banerjee
- Applicant Address: US PA Allentown
- Assignee: Air Products and Chemicals, Inc.
- Current Assignee: Air Products and Chemicals, Inc.
- Current Assignee Address: US PA Allentown
- Agent Anne B. Kiernan
- Main IPC: C11D7/50
- IPC: C11D7/50 ; C11D3/20 ; C11D11/00 ; C11D3/00 ; C11D3/30 ; C11D7/26 ; C11D3/43 ; C11D7/06 ; C11D7/32 ; C11D3/28 ; C11D3/04
Abstract:
A water-rich hydroxylamine formulation for photoresist and post-etch/post-ash residue removal in applications wherein a semiconductor substrate comprises aluminum. The cleaning composition comprises from about 2 to about 15% by wt. of hydroxylamine; from about 50 to about 80% by wt. of water; from about 0.01 to about 5.0% by wt. of a corrosion inhibitor; from about 5 to about 45% by wt. of a component selected from the group consisting of: an alkanolamine having a pKa
Public/Granted literature
- US20130061882A1 Cleaning Formulations and Method of Using the Cleaning Formulations Public/Granted day:2013-03-14
Information query
