发明授权
- 专利标题: Defect inspecting device and defect inspecting method
- 专利标题(中): 缺陷检查装置和缺陷检查方法
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申请号: US13520479申请日: 2010-12-27
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公开(公告)号: US08879821B2公开(公告)日: 2014-11-04
- 发明人: Kei Shimura
- 申请人: Kei Shimura
- 申请人地址: JP Tokyo
- 专利权人: Hitachi High-Technologies Corporation
- 当前专利权人: Hitachi High-Technologies Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Brundidge & Stanger, P.C.
- 优先权: JP2010-012362 20100122
- 国际申请: PCT/JP2010/073558 WO 20101227
- 国际公布: WO2011/089829 WO 20110728
- 主分类号: G06K9/00
- IPC分类号: G06K9/00 ; G01N21/956 ; G01N21/95
摘要:
The present invention provides a defect inspection system which enables an improvement in the efficiency of spatial filter settings, and at the same time enables automation of the spatial filter settings. An adjustable field-of-view diaphragm is narrowed to obtain an image of a spatial filter surface by use of an observation camera, and pixels of the image are classified into a plurality of groups according to the brightness level of bright spots of diffracted light. A spatial filter is set in such a manner that a group, the brightness level of which is highest, is light-shielded, and an observation image is then captured. Whether or not a repetitive pattern remains in the captured image is determined, and when it is determined that a repetitive pattern remains, the settings of the spatial filter are changed. The spatial filter is set in such a manner that in addition to the group which has been light-shielded earlier, a group, the brightness level of which is the highest next to the light-shielded group, can also be light-shielded. The same step is repeated until it is determined that no repetitive pattern remains. The settings of the spatial filter then end.
公开/授权文献
- US20130011043A1 DEFECT INSPECTING DEVICE AND DEFECT INSPECTING METHOD 公开/授权日:2013-01-10
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