发明授权
- 专利标题： Optical integrator for an illumination system of a microlithographic projection exposure apparatus
- 专利标题（中）： 用于微光刻投影曝光装置的照明系统的光学积分器
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申请号： US12973234申请日： 2010-12-20
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公开(公告)号： US08520307B2公开(公告)日： 2013-08-27
- 发明人: Oliver Wolf , Heiko Siekmann , Eva Kalchbrenner , Siegfried Rennon , Johannes Wangler , Andre Bresan , Michael Gerhard , Nils Haverkamp , Axel Scholz , Ralf Scharnweber , Michael Layh , Stefan Burkart
- 申请人： Oliver Wolf , Heiko Siekmann , Eva Kalchbrenner , Siegfried Rennon , Johannes Wangler , Andre Bresan , Michael Gerhard , Nils Haverkamp , Axel Scholz , Ralf Scharnweber , Michael Layh , Stefan Burkart
- 申请人地址： DE Oberkochen
- 专利权人： Carl Zeiss SMT GmbH
- 当前专利权人： Carl Zeiss SMT GmbH
- 当前专利权人地址： DE Oberkochen
- 代理机构： Fish & Richardson P.C.
- 主分类号： G02B27/10
- IPC分类号： G02B27/10
摘要：
The disclosure relates to an optical integrator configured to produce a plurality of secondary light sources in an illumination system of a microlithographic projection exposure apparatus. The disclosure also relates to a method of manufacturing an array of elongated microlenses for use in such an illumination system. Arrays of elongated microlenses are often contained in optical integrators or scattering plates of such illumination systems.
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