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US08492261B2 Damascene contacts on III-V CMOS devices 有权
Damascene接触III-V CMOS器件

Damascene contacts on III-V CMOS devices
摘要:
A method for manufacturing a III-V CMOS device is disclosed. The device includes a first and second main contact and a control contact. In one aspect, the method includes providing the control contact by using damascene processing. The method thus allows obtaining a control contact with a length of between about 20 nm and 5 μm and with good Schottky behavior. Using low-resistive materials such as Cu allows reducing the gate resistance thus improving the high-frequency performance of the III-V CMOS device.
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