发明授权
- 专利标题： Lithographic apparatus and method
- 专利标题（中）： 平版印刷设备和方法
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申请号： US11987009申请日： 2007-11-26
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公开(公告)号： US08416383B2公开(公告)日： 2013-04-09
- 发明人: Hernes Jacobs , Eva Mondt , Alexander Nikolov Zdravkov
- 申请人： Hernes Jacobs , Eva Mondt , Alexander Nikolov Zdravkov
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 主分类号： G03B27/52
- IPC分类号： G03B27/52 ; G03B27/58 ; G03B27/32 ; G03B27/42 ; G03B27/60
摘要：
A lithographic apparatus is disclosed that includes a seal provided in a substrate table, the seal being actuatable from an open configuration to a closed configuration, the closed configuration being such that when a substrate is located on the substrate table, the seal closes a gap between the substrate and the substrate table.
公开/授权文献
- US20080165331A1 Lithographic apparatus and method 公开/授权日：2008-07-10
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